*My surname has been changed since 1999 (Uno->Hijikata)

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Papers

Conferences

  • ((Invited))Yasuto Hijikata
    A Macroscopic Simulation of the SiC Thermal Oxidation Process based on the Si and C Emission Model
    The Asia-Pacific Conference on Silicon Carbide and Related Materials (APCSCRM) 2018 (Beijing, China) 2018.7.11.
  • Y. Hijikata, Y. Furukawa, Y.-i. Matsushita, and T. Ohshima
    Radiation Efficiency Enhancement of Single Photon Source near Stacking Fault in 4H-SiC Epilayer
    European Materials Research Society (E-MRS) 2018 Spring Meeting (Strasbourg, France) (I.8.3) 2018.6.20.
  • ((Invited))T. Ohshima, T. Honda, H. Tsunemi, T. Makino, S.-i. Sato, S. Onoda, Y. Hijikata
    Functionalization of Silicon Carbide by Particle Irradiation toward Quantum Devices
    2017 MRS Fall meeting (Boston, USA) (EM04.05.07) 2017.12.6.
  • Y. Hijikata, S. Akahori, and T. Ohshima
    Enhanced Single Photon Emission near Stacking Fault in 4H-SiC Epilayer
    Inter. Conf. SiC and Related Materials (ICSCRM2017) (TH.B1.2) (Washington D.C.) 2017.9.21.
  • H. Tsunemi, T. Honda, T. Makino, S. Onoda, S-I. Sato, Y. Hijikata, and T. Ohshima
    Various single photon sources observed in SiC pin diodes
    Inter. Conf. SiC and Related Materials (ICSCRM2017) (TU.BP.10) (Washington D.C.) 2017.9.19.
  • H. Kraus, D. Simin, C. Kasper, W. Kada, Y. Hijikata, C. J. Cochrane, T. Ohshima, V. Dyakonov, G. Astakhov
    Contraolled 3D Placement of Vacancy Spins for Quantum Applications in Silicon Carbide
    Inter. Conf. SiC and Related Materials (ICSCRM2017) (FR.B1.4) (Washington D.C.) 2017.9.23.
  • ((Invited))T. Ohshima, T. Honda, S. Onoda, T. Makino, Y. Hijikata, A. Lohrmann, J. R. Klein, B. C. Johnson, J. C. McCallum, S. Castelletto, B. C. Gibson, H. Kraus, V. Dyakonov, G. Astakhov
    Creation of Single Photon Sources in Wide Bandgap Semiconductors by Ion Irradiation
    26th Annual Meeting of MRS-J (D3-I20-001) (Yokohama) 2016.12.20.
  • T. Makino, S. Takano, S. Harada, K. Kojima, Y. Hijikata, and T. Ohshima
    Heavy Ion Induced Charge Collection in SiC MOSFETs
    26th Annual Meeting of MRS-J (D3-P21-010) (Yokohama) 2016.12.21.
  • ((Invited))T. Ohshima, T. Honda, S. Onoda, T. Makino, Y. Hijikata, A. Lohrmann, J. R. Klein, B. C. Johnson, J. C. McCallum, S. Castelletto, B. C. Gibson, H. Kraus, V. Dyakonov, G. Astakhov
    Creation of single photon emitters in silicon carbide using particle beam irradiation
    20th International Conference on Ion Beam Modification of Materials (IBMM2016) (Wellington, New Zealand) 2016.11.1.
  • ((Invited))T. Ohshima, T. Honda, S. Onoda, T. Makino, Y. Hijikata, A. Lohrmann, J. R. Klein, B. C. Johnson, J. C. McCallum, S. Castelletto, B. C. Gibson, H. Kraus, V. Dyakonov, G. Astakhov
    Creation and Functionalization of Defects in SiC by Irradiation and Thermal Treatment
    11th European Conference on SiC and Related Materials (ECSCRM2016) (We3b-1) (Halkidiki, Greece) 2016.9.28.
  • ((Invited))Ryosuke Asafuji and Yasuto Hijikata
    Generation of stacking faults in 4H-SiC epilayer during oxidation
    Energy Materials Nanotechnology (EMN) on Epitaxy 2016 (A05) (Budapest, Hungary) 2016.9.5.
  • Koichi Murata, Satoshi Mitomo, Takuma Matsuda, Takashi Tokoseki, Takahiro Makino, Akinori Takeyama, Shinobu Onoda,Shuichi Okubo, Yuki Tanaka, Mikio Kandori, Toru Yoshie, Takeshi Ohshima , Yasuto Hijikata
    Impacts of Gate Bias and its Variation on Gamma-ray Irradiation Resistance of SiC MOSFETs
    European Materials Research Society (E-MRS) 2016 Spring Meeting (L.P.I.8) (Lille, France) 2016.5.4.
  • S. Mitomo, T. Matsuda, K. Murata, T. Tokoseki, T. Makino, A. Takeyama, S. Onoda, T. Ohshima, S. Okubo, Y. Tanaka, M. Kandori, T. Yoshie, Y. Hijikata
    Optimum Structures for Gamma-ray Radiation Resistant SiC-MOSFETs
    European Materials Research Society (E-MRS) 2016 Spring Meeting (L.P.I.9) (Lille, France) 2016.5.4.
  • T. Ohshima, T. Yokoseki, K. Murata, T. Matsuda, S. Mitomo, T. Makino, S. Onoda, Y. Hijikata, Y. Tanaka, M. Kandori, S. Okubo, and T. Yoshie
    Development of Super Radiation Resistant Metal-Oxide-Semiconductor Transistor Based on Silicon Carbide
    International Workshop on Radiation Resistant Sensors and Related Technologies for Nuclear Power Plant Decommissioning 2016 (R2SRT2016) (Iwaki) 2016.4.20.
  • Y. Hijikata, S. Mitomo, T. Matsuda, K. Murata, T. Yokoseki, T. Makino, A. Takeyama, S. Onoda, Y. Tanaka, M. Kandori, T. Yoshie, and T. Ohshima
    A Development of Super Radiation-Hardened Power Electronics Using Silicon Carbide Semiconductors
    -Toward MGy-Class Radiation Resistivity-

    The 11th International Workshop on Radiation Effects on Semiconductor Devices for Space Applications (11th RASEDA), (12-4C) (Kiryu) 2015.11.12.
  • A. Takeyama, T. Matsuda, T. Yokoseki, S. Mitomo, K. Murata, T. Makino, S. Onoda, Y. Tanaka, M. Kandori, T. Yoshie, Y. Hijikata, and T. Ohshima
    Effect of Humidity and temperature on the Radiation Response of SiC MOSFETs
    The 11th International Workshop on Radiation Effects on Semiconductor Devices for Space Applications (11th RASEDA), (P6-11) (Kiryu) 2015.11.12.
  • K. Murata, S. Mitomo, T. Matsuda, T. Yokoseki, T. Makino, H. Abe, S. Onoda, T. Ohshima, A. Takeyama, S. Okubo, Y. Tanaka, M. Kandori, T. Yoshie, and Y. Hijikata
    Effect of Gate Bias on Radiation Response of SiC MOSFETs
    The 11th International Workshop on Radiation Effects on Semiconductor Devices for Space Applications (11th RASEDA), (P6-12) (Kiryu) 2015.11.12.
  • S. Mitomo, T. Matsuda, K. Murata, T. Yokoseki, T. Makino, A. Takeyama, S. Onoda, T. Ohshima, S. Okubo, Y. Tanaka, M. Kandori, T. Yoshie, and Y. Hijikata
    Difference by the Oxide Fabrication Process of the Gamma-ray Irradiation Effect on SiC-MOSFETs
    The 11th International Workshop on Radiation Effects on Semiconductor Devices for Space Applications (11th RASEDA), (P6-14) (Kiryu) 2015.11.12.
  • T. Yokoseki, T. Matsuda, S. Mitomo, K. Murata, T. Makino, H. Abe, A. Takeyama, S. Onoda, Y. Tanaka, M. Kandori, T. Yoshie, Y. Hijikata, T. Ohshima
    Effect of Gamma-ray Irradiation at High Temperature on the Characteristics of SiC MOSFETs
    The 11th International Workshop on Radiation Effects on Semiconductor Devices for Space Applications (11th RASEDA), (P6-15) (Kiryu) 2015.11.12.
  • T.Matsuda, T.Yokoseki, S. Mitomo, K. Murata, T. Makino, A. Takeyama, S. Onoda, S. Okubo, Y. Tanaka, M. Kandori, T. Yoshie, T. Ohshima, and Y. Hijikata
    Characteristics of Silicon Carbide Metal-Oxide-Semiconductor Capacitors Irradiated with Gamma-rays at Elevated Temperature
    The 11th International Workshop on Radiation Effects on Semiconductor Devices for Space Applications (11th RASEDA), (P6-16) (Kiryu) 2015.11.12.
  • Yugo Kobayashi, Takashi Yokoseki, Takuma Matsuda, Satoshi Mitomo, Koichi Murata, Michihiro Hachisuka, Yasuyoshi Kaneko, Takahiro Makino, Akinori Takeyama, Shinobu Onoda, Takeshi Ohshima, Yuki Tanaka, Mikio Kandori, Toru Yoshie, Yasuto Hijikata
    Gamma-ray irradiation response of the motor-driver circuit with SiC MOSFETs
    Inter. Conf. SiC and Relat. Mater. (ICSCRM2015) (Tu-P-50) (Giargini Naxos, Italy) 2015.10.6.
  • Takuma Matsuda, Takashi Tokoseki, Satoshi Mitomo, Koichi Murata, Takahiro Makino, Hiroshi Abe, Akinori Takeyama, Shinobu Onoda, Yuki Tanaka, Mikio Kandori, Toru Yoshie, Yasuto Hijikata, Takeshi Ohshima
    Change in Characteristics of SiC MOSFETs by Gamma-ray Irradiation at High Temperature
    Inter. Conf. SiC and Relat. Mater. (ICSCRM2015) (We-P-45) (Giargini Naxos, Italy) 2015.10.7.
  • T.Miyazaki, T. Makino, A. Takeyama, S. Onoda, T. Ohshima, Y. Tanaka, M. Kandori, T. Yoshie, Y. Hijikata
    Effect of gamma-ray irradiation on the device process-induced defects in 4H-SiC epilayers
    The 16th conference on Defects-Recognition, Imaging and Physics in Semiconductors (DRIP-XVI 2015) (OTU15) (Suzhou, China) 2015.9.8.
  • ((Invited))T. Ohshima, T. Yokoseki, K. Murata, T. Matsuda, S. Mitomo, H. Abe, T. Makino, S. Onoda, Y. Hijikata, Y. Tanaka, M. Kandori, S. Okubo, and T. Yoshie
    Radiation Response of Silicon Carbide Metal-Oxide-Semiconductor Transistors in High Dose Region
    ISPlasma2015 (B3-I-02) (Nagoya) 2015.3.27.
  • T. Suzuki, K. Osada, S. Yagi, S. Naito, Y. Hijikata, Y. Okada, and H. Yaguchi
    Molecular Beam Epitaxy Growth of Intermediate Band Materials Based on GaAs:N δ-Doped Superlattices
    6th World Conference on Photovoltaic Energy Conversion (1TuO.7.4) (Kyoto) 2014.11.25.
  • K. Osada, T, Suzuki, S. Yagi, S. Naito, Y. Shoji, Y. Okada, Y. Hijikata, and H. Yaguchi
    Control of Intermediate Band Configuration in GaAs:N δ-doped Superlattice
    6th World Conference on Photovoltaic Energy Conversion (1WePo.1.9) (Kyoto) 2014.11.26.
  • T. Yokoseki, H. Abe, T. Makino, S. Onoda, Y. Tanaka, M. Kandori, T. Yoshie, Y. Hijikata and T. Ohshima
    Recovery of the Electrical Characteristics of SiC MOSFETs Irradiated with Gamma-rays by Thermal Treatments
    10th Europian Concerence on Silicon Carbide and Related Materilas (Mo-P-LN-10) (Grenoble, France) 2014.9.22.
  • Y. Miyano, S. Yagi, Y. Hijikata, H. Yaguchi
    Photoluminescence Study of Oxidation-Induced Stacking Faults in 4H-SiC Epilayers
    10th Europian Concerence on Silicon Carbide and Related Materilas (We-P-44) (Grenoble, France) 2014.9.24.
  • D. Goto, S. Yagi, Y. Hijikata, H. Yaguchi
    Surface orientation dependence of SiC oxidation process studied by in-situ spectroscopic ellipsometry
    10th Europian Concerence on Silicon Carbide and Related Materilas (We-P-58) (Grenoble, France) 2014.9.24.
  • S. Sato, S. Onoda, T. Makino, N. Fujuta, T. Ohshima1, T. Yokoseki, K. Tanaka, Y. Hijikata, Y. Tanaka, M. Kandori, T. Yoshie
    Gamma-Ray Irradiation Response of Silicon Carbide Semiconductor Devices: Extremely High Radiation Resistance
    7th International Youth Nuclear Congress (TS33B-5) (Burgos, Spain) 2014.7.9.
  • S. Yagi, J. Suzuki, M. Orihara, Y. Hijikata, H. Yaguchi
    Resonant tunneling of electrons through cubic-InN quantum dots embedded in GaN
    The 41st International Symposium on Compound Semiconductors (P45) (Montpellier, France) 2014.5.12.
  • Y. Yamazaki, S. Yagi, Y. Hijikata, K. Onabe, H. Yaguchi
    Anomalous excitation power dependence of the luminescence from GaAsN/GaAs quantum well
    The 41st International Symposium on Compound Semiconductors (P48) (Montpellier, France) 2014.5.12.
  • S. Yagi, S. Noguchi, Y. Hijikata, H. Yaguchi, S. Kuboya, K. Onabe, Y. Okada
    Fabrication and Characterization of Intermediate Band Solar Cells Using GaAs:N Delta-Doped Superlattice
    23rd International Photovoltaic Science and Engineering Conference (4-O-7) (Taipei, Taiwan) 2013.10.30.
  • S. Yagi, S. Noguchi, Y. Hijikata, S. Kuboya, K. Onabe, Y. Okada, and H. Yaguchi
    Intermediate band solar cells based on GaAs:N ƒΒ-doped superlattices
    4th International Workshop on Epitaxial Growth and Fundamental Properties of Semiconductor Nanostructures (I-35) (Lake Arrowhead, USA) 2013.10.3.
  • K. Takamiya, S. Yagi, Y. Hijikata, T. Mochizuki, M. Yoshita, H. Akiyama, S. Kuboya, R. Katayama, K. Onabe, and H. Yaguchi
    Excitation power dependence of the emission from various N-N pairs in N ƒΒ-doped GaAs
    4th International Workshop on Epitaxial Growth and Fundamental Properties of Semiconductor Nanostructures (C-18) (Lake Arrowhead, USA) 2013.10.3.
  • Y. Hijikata, Y. Akasaka, S. Yagi, and H. Yaguchi
    Si emission into the oxide layer during oxidation of silicon carbide
    Inter. Conf. SiC and Relat. Matter. (ICSCRM2013) (Th2B-4)(Miyazaki) 2013.10.3.
  • W. Okubo, S. Yagi, Y. Hijikata, K. Onabe and H. Yaguchi
    Photoreflectance Study of the Temperature Dependence of Excitonic Transitions in Dilute GaAsN Alloys
    10th International Conference on Nitride Semiconductors 2013 (B10.05) (Washington, DC) 2013. 8. 28.
  • S. Yagi, S. Noguchi, Y. Hijikata, S. Kuboya, K. Onabe and H. Yaguchi
    Enhancement of High Energy Band Optical Transition in GaAs:N Delta-Doped Superlattices for Intermediate Band Solar Cells
    International Union of Materials Research Societies - International Conference on Electronic Materials 2012 (A-1-P26-014) (Yokohama) 2012. 9. 26.
  • R. G. Jin, S. Yagi, Y. Hijikata, S. Kuboya, K. Onabe, R. Katayama and H. Yaguchi
    Molecular beam epitaxy of ErGaAs alloys on GaAs (001) substrates
    17th International Conference on Molecular Beam Epitaxy (MoP-21) (Nara) 2012. 9. 24.
  • J. Suzuki, M. Orihara, S. Yagi, Y. Hijikata and H. Yaguchi
    RF-MBE growth of cubic InN quantum dots on cubic GaN
    17th International Conference on Molecular Beam Epitaxy (MoP-24) (Nara) 2012. 9. 24.
  • Y. Hijikata, S. Yagi, H. Yaguchi, and S. Yoshida
    Model calculations of SiC oxide growth rates at sub-atmospheric pressures using the Si and C emission model
    9th Euro. Conf. SiC and Relat. Matter. (ECSCRM2012) (TuP-63)(Saint-Petersburg, Russia) 2012.9.
  • K. Takamiya, T. Fukushima, S. Yagi, Y. Hijikata, T. Mochizuki, M. Yoshita, H. Akiyama, S. Kuboya, K. Onabe, R. Katayama, and H. Yaguchi
    Biexciton Emission from Single Isoelectronic Traps Formed by Nitrogen-Nitrogen Pairs in GaAs
    31st International Conference on the Physics of Semiconductors (69.7) (Zurich, Switzerland) 2012. 8. 2.
  • S. Noguchi, S. Yagi, Y. Hijikata, S. Kuboya, K. Onabe, and H. Yaguchi
    Analysis of the Energy Structure of Nitrogen Delta-Doped GaAs Superlattices for High-Efficiency Intermediate-Band Solar Cells
    38th IEEE Photovoltaic Specialists Conference (Austin, USA) 2012. 6. 4
  • K. Takamiya, T. Fukushima, S. Yagi, Y. Hijikata, T. Mochizuki, M. Yoshita, H. Akiyama, S. Kuboya, K. Onabe, R. Katayama and H. Yaguchi
    Biexciton Emission from Single Isoelectronic Traps in Nitrogen Atomic-Layey-Doped GaAs
    3rd International Workshop on Epitaxial Growth and Fundamental Properties of Semiconductor Nanostructures (P22)(Traunkirchen, Austria) 2011. 9. 12
  • K. Takamiya, Y. Endo, T. Fukushima, S. Yagi, Y. Hijikata, T. Mochizuki, M. Yoshita, H. Akiyama, S. Kuboya, K. Onabe, R. Katayama, and H. Yaguchi
    Single Photon Generation from Nitrogen Atomic-Layer Doped Gallium Arsenide
    7th International Conference on Processing & Manufacturing of Advanced Materials (FILMS 1-11) (Quebec, Canada) 2011. 8. 3
  • M. Orihara, S. Yagi, Y. Hijikata, H. Yaguchi
    RF-MBE Growth of Semipolar InN(10-13) and InGaN(10-13) on GaAs(110)
    9th International Conference on Nitride Semiconductors (PD3.19) (Glasgow, UK) 2011. 7. 13
  • S. Yagi, Y. Hijikata, Y. Okada, H. Yaguchi
    Quantum Well Double Barrier Resonant Tunneling Structures for Selective Contacts of Hot Carrier Solar Cells
    37th IEEE Photovoltaic Specialists Conference (Seattle, USA) 2011. 6. 23
  • Yasuto Hijikata, Hiroyuki Yaguchi, and Sadafumi Yoshida
    "Theoretical studies for Si and C emission into SiC layer during oxidation"
    8th European Conference on Silicon Carbide and Related Materials (ECSCRM), Mo3-6 (Oslo, Norway) 2010.8.30.
  • M. Orihara, S. Takizawa, T. Sato, Y. Ishida, S. Yoshida, Y. Hijikata, H. Yaguchi
    "RF-MBE Growth of InN on 4H-SiC(0001) with Off-angles"
    8th International Conference on Nitride Semiconductors (ICNS), ThP13 (Jeju, Korea) 2009. 10. 22.
  • Yasuto Hijikata, Hiroyuki Yaguchi and Sadafumi Yoshida
    "Model calculation of SiC oxide growth rate at various oxidation temperatures based on the silicon and carbon emission model"
    Int. Conf. SiC Relat. Mater. (ICSCRM), Th-3B-5 (Nurnberg, Germany) 2009.10.15.
  • Keiko Kouda, Yasuto Hijikata, Hiroyuki Yaguchi and Sadafumi Yoshida
    "In-situ Spectroscopic Ellipsometry Study of SiC Oxidation at Low Oxygen-Partial-Pressures"
    Int. Conf. SiC Relat. Mater. (ICSCRM), Tu-P-40 (Nurnberg, Germany) 2009.10.13.
  • T. Fukushima, M. Ito, Y. Hijikata, H. Yaguchi, S. Yoshida, M. Okano, M. Yoshita, H. Akiyama, S. Kuboya, R. Katayama, K. Onabe
    "Photoluminescence from single isoelectronic traps in nitrogen delta-doped GaAs grown on GaAs(111)"
    The 14th International Conference on Modulated Semiconductor Structures (Tu-mP5) (Kobe) 2009. 7. 21.
  • Yasuto Hijikata, Hiroyuki Yaguchi and Sadafumi Yoshida
    "Model Calculation of SiC Oxide Growth Rate based on the Silicon and Carbon Emission Model"
    European Conf. SiC Relat. Mater. (ECSCRM), WeP-18 (Barcelona) 2008.9.10.
  • Hideyasu Seki, Takahiro Wakabayashi, Yasuto Hijikata, Hiroyuki Yaguchi and Sadafumi Yoshida
    "Characterization of 4H-SiC-SiO2 Interfaces by a Deep Ultraviolet Spectroscopic Ellipsometer"
    European Conf. SiC Relat. Mater. (ECSCRM), WeP-19 (Barcelona) 2008.9.10.
  • Toshiyuki Takaku, Yasuto Hijikata, Hiroyuki Yaguchi and Sadafumi Yoshida
    "Observation of SiC Oxidation in Ultra-Thin Oxide Regime by In-Situ Spectroscopic Ellipsometry"
    European Conf. SiC Relat. Mater. (ECSCRM), WeP-20 (Barcelona) 2008.9.10.
  • Takeshi Yamamoto, Yasuto Hijikata, Hiroyuki Yaguchi and Sadafumi Yoshida
    "Oxygen-Partial-Pressure Dependence of SiC Oxidation Rate Studied by In-situ Spectroscopic Ellipsometry"
    Int. Conf. SiC Relat. Mater. (ICSCRM), WeP-64 (Otsu) 2007.10.15.
  • Yasuto Hijikata, Takeshi Yamamoto, Hiroyuki Yaguchi and Sadafumi Yoshida
    "Model Calculation of SiC Oxidation Rates in the Thin Oxide Regime"
    Int. Conf. SiC Relat. Mater. (ICSCRM), WeP-63 (Otsu) 2007.10.15.
  • T. Inoue, Y.Iwahashi, S. Oishi, M. Orihara, Y. Hijikata, H. Yaguchi, and S. Yoshida
    "Photoluminescence of cubic InN films on MgO(001) substrates"
    7th International Conference on Nitride Semiconductors (ICNS), WP59 (Las Vegas, USA) 2007. 9. 19.
  • G. Shikata, S. Hirano, T. Inoue, M. Orihara, Y. Hijikata, H. Yaguchi, and S. Yoshida
    "Improvement of the surface morphology of a-plane InN using low-temperature InN buffer layers"
    7th International Conference on Nitride Semiconductors (ICNS), BB3 (Las Vegas, USA) 2007. 9. 20.
  • S. Hirano, T. Inoue, G. Shikata, M. Orihara, Y. Hijikata, H. Yaguchi, S. Yoshida
    "Photoluminescence Study of Hexagonal InN/InGaN Quantum Well Structures Grown on 3C-SiC (001) Substrates by Molecular Beam Epitaxy"
    7th International Conference on Nitride Semiconductors (ICNS), WP60 (Las Vegas, USA) 2007. 9. 19.
  • Y. Endo, K. Tanioka, Y. Hijikata, H. Yaguchi, S. Yoshida, M. Yoshita, H. Akiyama, W. Ono, F. Nakajima, R. Katayama, and K. Onabe
    "Twin photoluminescence peaks from single isoelectronic traps in nitrogen delta-doped GaAs"
    13th International Conference on Modulated Semiconductor Structures (MSS), PM11 (Genova, Italy) 2007. 7. 17.
  • H. Yaguchi, T. Aoki, T. Morioke, Y. Hijikata, S. Yoshida, M. Yoshita, H. Akiyama, D. Aoki, and K. Onabe
    Photoluminescence Study of Isoelectronic Traps in Dilute GaAsN alloys
    International Workshop on Nitride Semiconductors 2006 (IWN2006) MoP2-71, (Kyoto, 2006. 10. 23)
  • S. Hirano, T. Inoue, G. Shikata, M. Orihara, Y. Hijikata, H. Yaguchi, and S. Yoshida
    RF-MBE growth of InN/InGaN quantum well structures on 3C-SiC substrates
    Int. Conf. MBE, TuP-23, p.136 (Tokyo, 2006.9.5).
  • G. Shikata, S. Hirano, T. Inoue, M. Orihara, Y. Hijikata, H. Yaguchi and S. Yoshida
    RF-MBE growth of a-plane InN on r-plane sapphire with a GaN underlayer
    Int. Conf. MBE, TuP-24, p.137 (Tokyo, 2006.9.5).
  • Shingo Oishi, Yasuto Hijikata, Hiroyuki Yaguchi, and Sadafumi Yoshida
    Simultaneous Determination of the Carrier Concentration, Mobility and Thickness of SiC Homo-Epilayers Using Terahertz Reflectance Spectroscopy
    European Conf. SiC Relat. Mater. (ECSCRM), MoP79 p.13 (Newcastle, U.K., 2006.9.4)
  • Yasuto Hijikata, Sadafumi Yoshida, Francesco Moscatelli, Antonella Poggi, Sandro Solmi, Stefano Cristiani and Roberta Nipoti
    Fabrication of MOS Capacitors by Wet Oxidation of p-type 4H-SiC Preamorphized by Nitrogen Ion Implantation
    European Conf. SiC Relat. Mater. (ECSCRM), WeP44 p.34 (Newcastle, U.K., 2006.9.6)
  • Antonella Poggi, Francesco Moscatelli, Yasuto Hijikata, Sandro Solmi, Michele Sanmartin, Fabrizio Tamarri and Roberta Nipoti
    Characterization of MOS Capacitors Fabricated on n-type 4H-SiC Implanted with Nitrogen at High Dose
    European Conf. SiC Relat. Mater. (ECSCRM), MoP57 p.11 (Newcastle, U.K., 2006.9.4)
  • Y. Endo, K. Tanioka, Y. Hijikata, H. Yaguchi, S. Yoshida, M. Yoshita, H. Akiyama, W. Ono, F. Nakajima, R. Katayama, and K. Onabe
    Micro-photoluminescence study of nitrogen atomic-layer doped GaAs
    25th Electronic Materials Symposium (I4) (Izu-no-kuni) 2006. 7. 6
  • K. Tanioka, Y. Endo, Y. Hijikata, H. Yaguchi, S. Yoshida, M. Yoshita, H. Akiyama, and K. Onabe
    Micro Raman study on the improvement of luminescence efficiency of GaAsN alloys
    Int. Conf. MOVPE, (Miyazaki, 2006.5).
  • Y. Endo, K. Tanioka, Y. Hijikata, H. Yaguchi, S. Yoshida, M. Yoshita, H. Akiyama, F. Nakajima, R. Katayama, and K. Onabe
    Micro-photoluminescence study of nitrogen -doped GaAs grown by metalorganic vapor phase epitaxy
    Int. Conf. MOVPE, (Miyazaki, 2006.5).
  • S. Yoshida, K. Kabubari, Y. Hijikata, H. Yaguchi and M. Yoshikawa
    Real-time Observation of SiC Oxidation using an in situ Ellipsometer
    2006 Japanese-Spanish-German Joint Workshop on Advanced Semiconductor Optoelectronic Materials and Devices (Berlin, Germany, 2006.3).
  • Y. Hijikata, H. Yaguchi, S. Yoshida, Y. Takata, K. Kobayashi, H. Nohira, and T. Hattori
    "Off-Angle Dependence of Characteristics of 4H-SiC-Oxide Interfaces"
    Inter. Conf. SiC Relat. Mater., (Pittsburg, USA, 2005.9).
  • K. Kakubari, R. Kuboki, Y. Hijikata, H. Yaguchi, and S. Yoshida
    "Real Time Observation of SiC Oxidation using In-Situ Spectroscopic Ellipsometer"
    Inter. Conf. SiC Relat. Mater., (Pittsburg, USA, 2005.9).
  • Y. Iwahashi, A. Nishimoto, M. Orihara, Y. Hijikata, H. Yaguchi, and S. Yoshida
    "RF-MBE growth of cubic InN films on MgO(001) substrates"
    6th Inter. Conf. Nitride Semiconductor, (Bremen, Germany, 2005.8).
  • H. Yaguchi, T. Morioke, T. Aoki, H. Shimizu, Y. Hijikata, S. Yoshida, M. Yoshita, H. Akiyama, N. Usami, D. Aoki, and K. Onabe
    Photo-induced improvement of radiative efficiency and structural changes in GaAsN alloys
    6th International Conference on Nitride Semiconductors (Bremen, Germany, 2005. 8).
  • S.Yoshida, Y.Kitamura, Y.Iwahashi, H.Tada, M.Orihara, Y.Hijikata, and H.Yaguchi
    "Epitaxial Growth of Hexagonal and Cubic InN Films by Gas Source Molecular Beam Epitaxy"
    7th China-Japan Symposium on Thin Films (China, 2004.9).
  • Y.Hijikata, H.Yaguchi, S.Yoshida, Y.Takata, K.Kobayashi, S.Shin, H.Nohira, T.Hattori
    "Characterization of Oxide Films on SiC Epitaxial (000-1) Faces by Angle-Resolved Photoemission Spectroscopy Measurements using Synchrotron Radiation"
    European Conf. SiC Relat. Mater.,WeP1-67 (Bologna, Itary, 2004.9).
  • H. Yaguchi, Y. Kitamura, K. Nishida, Y. Iwahashi, Y. Hijikata and S. Yoshida
    "Growth of high-quality hexagonal InN on 3C-SiC (001) by molecular beam epitaxy"
    Int. Workshop on Nitride Semiconductors, (Pittsburgh, USA, 2004.7).
  • K.Nishida, Y.Kitamura, Y.Hijikata, H.Yaguchi, and S.Yoshida
    "Epitaxial Growth of Hexagonal and Cubic InN Films"
    Int. Sympo. Blue Light LED (ISBLLED), (Gyeongju, Korea, 2004.3).
  • S.Yoshida, K.Nishida, Y.Kitamura, M.Orihara, Y.Hijikata, and H.Yaguchi
    "Epitaxial Growth of Hexagonal and Cubic InN Films and Their Properties"
    Japanese-Spanish-German Workshop 2004 on Recent Progress in Advanced Materials, Devices, Processing and Characterization (Ohita, Japan, 2004.3).
  • K. Narita, Y. Hijikata, H. Yaguchi, S.Yoshida, J. Senzaki and S. Nakashima
    "Characterization of electrical properties in high-dose implanted and post-implantation-annealed 4H-SiC wafers using infrared reflectance spectroscopy"
    10th Inter. Conf. SiC Relat. Mater., TuP4-9 (Lyon, France, 2003.10).
  • Y. Hijikata, H. Yaguchi, Y. Ishida, M. Yoshikawa, T. Kamiya and S.Yoshida
    "Photoemission Spectroscopic Studies on Oxide/SiC Interfaces Formed by Dry and Pyrogenic Oxidation "
    10th Inter. Conf. SiC Relat. Mater., MoP3-10 (Lyon, France, 2003.10).
  • H. Yaguchi, T. Morioke, T. Aoki, Y. Hijikata, S. Yoshida, H. Akiyama, N. Usami, D. Aoki, K. Onabe
    Improvement in the luminescence efficiency of GaAsN alloys by photoexcitation
    5th International Conference on Nitride Semiconductors (Nara, Japan, 2003. 5).
  • H. Kanaya, H. Yaguchi, Y. Hijikata, S. Yoshida, S. Miyoshi, K. Onabe
    Spectroscopic ellipsometry study on the dielectric functions of GaPN alloys
    5th International Conference on Nitride Semiconductors (Nara, Japan, 2003. 5).
  • Y. Hijikata, Satoshi Kawato, S. Sekiguchi, H. Yaguchi, Y. Ishida, M. Yoshikawa, T. Kamiya and S. Yoshida
    "Photoemission Spectroscopy and In-Situ Spectroscopic Ellipsometry Studies on the Ar Post-Oxidation-Annealing Effects of Oxide/SiC Interfaces"
    Proc. Asia-Pacific Workshop on Widegap Semiconductors, (Awaji island, Japan) Mav06, pp.127-132.
    PDF (580K)
  • H. Yaguchi, M. Baba, H. Akiyama, D. Aoki, K. Onabe, Y. Hijikata and S. Yoshida
    "Time-Resolved Photoluminescence Study of GaAsN Alloys"
    International Workshop on Nitride Semiconductors (Aachen, Germany) 2002. 7
  • H. Yaguchi, Y. Hijikata, S. Yoshida, M. Baba, H. Akiyama, D. Aoki and K. Onabe
    "Time-resolved photoluminescence of GaAsN alloys grown by metalorganic vapor phase epitaxy"
    21st Electronic Materials Symposium (I6) (Izu-Nagaoka) 2002. 6
  • S. Yoshida, Y. Tomioka, M. Midorikawa,Y. Hijikata, and H. Yaguchi
    "Characterization of Oxide/SiC Interfaces by Spectroscopic Ellipsometry and XPS"
    Japanese-Spanish-German Workshop 2002 on Recent Progress in Advanced Materials, Devices, Processing and Characterization (Cordoba, Spain) 2002.3
  • S. Yoshida, T. Iida, Y. Tomioka, Y. Hijikata, M. Orihara, and H. Yaguchi
    "Depth Profiling of the Refractive Indices in Oxide Films on SiC by Spectroscopic Ellipsometry"
    6th China-Japan Symposium on Thin Films (Kunming, China) 2001. 11
  • Y. Hijikata, H. Yaguchi, M. Yoshikawa, and S. Yoshida
    "x-ray photoelectron spectroscopy studies of post oxidation process effects on oxide/SiC interfaces,"
    Int. Conf. SiC & Rela. Mater. (ICSCRM), WeP-66, p.755, 2001.11.
  • Y. Ishida, T. Takahashi, H. Okumura, T. Jikimoto, H. Tsuchida, M. Yoshikawa, Y. Tomioka, M. Midorikawa, Y. Hijikata and S. Yoshida
    "The investigations of 4H-SiC/SiO2 interfaces by optical and electrical measurements,"
    Int. Conf. SiC & Rela. Mater. (ICSCRM), ThP-66, p.777, 2001.11.
  • H. Yaguchi, K. Narita, Y. Hijikata, S. Yoshida, S. Nakashima, and N. Oyanagi
    "Spatial mapping of the carrier concentration and mobility in SiC wafers by micro Fourier-transfrom infrared spectroscopy,"
    Int. Conf. SiC & Rela. Mater. (ICSCRM), WeP-80, p.769, 2001.11.
  • Y. Tomioka, T. Iida, M. Midorikawa, H. Tukada, K. Yoshimoto, Y. Hijikata, H. Yaguchi, M. Yoshikawa, Y. Ishida, R. Kosugi and S. Yoshida
    "Characterization of the interfaces between SiC and oxide films by spectroscopic ellipsometry,"
    Int. Conf. SiC & Rela. Mater. (ICSCRM), ThB2-6, pp.531-532, 2001.11.
  • H. Yaguchi, S. Kikuchi, Y. Hijikata, S. Yoshida, D. Aoki and K. Onabe
    "Photoluminescence Study on Temperature Dependence of Band Gap Energy of GaAsN Alloys"
    The Fourth International Conference on Nitride Semiconductors (ICNS-4) (Denver, USA) 2001. 7.
  • H. Yaguchi, S. Matsumoto, Y. Hijikata, S. Yoshida, T. Maeda, M. Ogura, D. Aoki and K. Onabe
    "Spectroscopic Ellipsmemtry Study on the Electronic Structure Near the Absorption Edge of GaAsN Alloys"
    The Fourth International Conference on Nitride Semiconductors (ICNS-4) (Denver, USA) 2001. 7.
  • H. Yaguchi, T. Nakamura, Y. Hijikata, S. Yoshida, K. Kojima, X. Shen and H. Okumura
    "Persistent Photoconductivity in Si-Doped n-Type GaN"
    The Fourth International Conference on Nitride Semiconductors (ICNS-4) (Denver, USA) 2001. 7.
  • H. Yaguchi, S. Kikuchi, Y. Hijikata, S. Yoshida, D. Aoki and K. Onabe
    "Temperature dependence of photoluminescence of GaAsN alloys,"
    20th Electronic Materials Symposium (C4) (Nara) 2001. 6.
  • Y. Hijikata, H. Yaguchi, M. Yoshikawa and S. Yoshida
    "Composition Analysis of SiO2/SiC Interfaces by Electron Spectroscopic Measurements using Slope Shaped Oxide Films,"
    E-MRS spring meeting, F-II.6, p.F-5, Jury, 2001.
  • T. Iida, Y. Tomioka, K. Matsunaka, Y. Hijikata, H. Yaguchi, M. Yoshikawa, Y. Ishida, H. Okumura and S. Yoshida
    "Characterization of Oxide Films on SiC by Spectroscopic Ellipsometer",
    Extended Abstracts of 1st Intern. Workshop on Ultra-Low-Loss Power Device Technology, pp.203-204, May, 2000.
  • Y. Uno and K. Nakamura
    "A Fiber Optic Micro-Probe Array with Wavelength-Division- Multiplexing Technique for Ultrasonic Field Measurements",
    IEEE Ultrasonics Sympo., II-2, pp. 1273-1276, Oct. 1998.
  • Y. Uno and K. Nakamura
    "Measurements of high-frequency ultrasonic field by a fiber optic micro-probe",
    12th Int. Conf. Optical Fiber Sensors, OTuD6, pp.87-90, Oct. 1997.
  • Y. Uno and K. Nakamura
    "Characteristics of a Sharply Bent Optical Fiber for Sound Field Measurements",
    11th Int. Conf. Optical Fiber Sensors, Th5-6, pp.658-661, May 1996.

Books

  • Y. Hijikata, Y.-I. Matsushita, and T. Ohshima
    "SiC thermal oxidation process and MOS interface characterizations: From carrier transportation to single-photon source" (Chapter 8) in "Handbook of Silicon Carbide Materials and Devices"
    Ed. Zhe C. Feng, Taylor & Francis, CRC (May 31, 2023).
    www.routledge.com/9780367188269


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